Cressington 208HRD High Resolution Sputter Coater from Cressington offers real solutions to the problems encountered when coating difficult samples for FESEM imaging. FESEM applications need extremely thin, fine-grained, uniform coatings to eliminate charging and to improve contrast on low density materials. In order to minimize the effects of grain size, the 208HR offers a full range of coating materials and gives unprecedented control over thickness and deposition conditions. The 208HRD Turbo Pumped High Vacuum System offers a wide range of operating pressures allowing precise control of both uniformity and conformity of the coating, minimizing charging effects.

The 208HRD employs a compact 28mm diameter target design that offers higher efficiency to better utilize more expensive target materials such as iridium. An additional benefit with using a smaller diameter sputter source is that it helps lower the total system cost with target compared to larger target systems.

Sputter Target : Cr, Pd/Pt as standard, ( Ta, Au, Au/Pd, Pt, Ir or W is optional )

The main features are:-

Wide Choice of Coating MaterialsMagnetron head design and effective gas handling allow a wide choice of target materials (see specification).

Precision Thickness Control:-Thickness optimized to the FE-SEM operating voltage using the MTM-20 high resolution thickness controller.

Multiple Sample Stage Movements:-Separate rotary, planetary and tilting movements allow optimized coating distribution and coverage. (view RPT Stage)

Variable Chamber Geometry:-Chamber geometry is used to adjust deposition rates from 1.0 nm/sec to 0.002 nm/sec to optimize structure.

Wide Range of operating Pressures:-Independent power/pressure adjustment allows operation at argon gas pressure ranges.

Compact Modern Benchtop Design:-Space and energy saving design eliminates need for floor space, water, specialized electrical connections.

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