Cressington 208HR now offers real solutions to the problems encountered when coating difficult samples for FE-SEM. In oder to minimize the effects of grain size the 208HR offers a full range of coating materials and gives unprecedented control over thickness and deposition conditions. To minimize charging effects the 208HR stage design and wide range of operating pressures allows precise control of the uniformity and conformity of the coating. The HIGH/LOW chamber configuration allows easy adjustment of working distance.
Sputter Target : Cr, Pd/Pt as standard, ( Ta, Au, Au/Pd, Pt, Ir or W is optional )
The main features are:-
Wide Choice of Coating MaterialsMagnetron head design and effective gas handling allow a wide choice of target materials (see specification).
Precision Thickness Control:-Thickness optimized to the FE-SEM operating voltage using the MTM-20 high resolution thickness controller.
Multiple Sample Stage Movements:-Separate rotary, planetary and tilting movements allow optimized coating distribution and coverage. (view RPT Stage)
Variable Chamber Geometry:-Chamber geometry is used to adjust deposition rates from 1.0 nm/sec to 0.002 nm/sec to optimize structure.
Wide Range of operating Pressures:-Independent power/pressure adjustment allows operation at argon gas pressure ranges of 0.2 – 0.005 mbar.
Compact Modern Benchtop Design:-Space and energy saving design eliminates need for floor space, water, specialized electrical connections.
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